X-ray diffraction oven chamberHTK 1200N

high-temperature

The HTK 1200N is an advanced high-temperature chamber with a robust design for in-situ X-ray diffraction studies in different atmospheres up to 1200 °C. Its environmental heater guarantees excellent uniformity of the sample temperature. Use the HTK 1200N for different types of in-situ X-ray investigations, including studies of phase transformations, structure determination, and studies of chemical reactions. Key Features Precise temperature measurement and control •Highly reliable temperature measurement right at the sample •Excellent temperature uniformity in the sample •Almost no restrictions on sample thickness Sample spinning is crucial •Sample spinning option for optimum data quality •Sample carriers of various chemically resistant materials available •Quick exchange of sample carriers for easy sample preparation The ideal tool for a wide range of applications •Robust and compact design using high quality materials •Fits most available goniometers •Available with automated motorized z-aligment stage for temperature-dependent sample realignment